Abstract
The incorporation of fluorine in hydrogenated silicon carbide films was carried out by pulsed glow discharge deposition, and its effects on the structure, mechanical, optical, and surface properties were investigated. Fluorine incorporation occurs mostly in the form of single Si–F bonds and no C–F bonds were revealed by infrared and x-ray photoelectron spectroscopies. Films with higher F contents have lower Si/C ratios, and the excess of C favors the formation of graphitic agglomerates which decrease the hardness of the films. Films with 16 at. % F exhibit 10 GPa hardness. Our results indicate that the chemical states in which F is incorporated into a-SiC:H films play important roles in the surface and optical properties. C–F bonds, in opposition to Si–F bonds, control the wettability and optical gap of this material.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
More From: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.