Abstract
A method is presented to investigate in-situ the relaxation behaviour of strained Si1-xGex layers on silicon substrates using a conventional X-ray powder diffractometer with a high-temperature attachment. It allows by a stair-like ramping of temperature a fast determination of the critical temperature at which relaxation starts. The method was used to investigate the temperature and time dependence of relaxation of SiGe layers grown by chemical vapour deposition. It was found that the relaxation mechanism changes drastically at temperatures above 950 °C.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.