Abstract
Intensity oscillation phenomenon due to layer-by-layer growth, which has been observed in reflected electron beams and in very intensive X-rays from SR sources, was observed in X-ray scattering experiments using a rotating-anode source. We have constructed a compact ultrahigh vacuum (UHV) X-ray diffractometer for surface glancing X-ray scattering. All the equipment, including a rotating-anode source of 18 kW and a UHV specimen chamber, are arranged on one small optical table. As the first experiment using this instrument, in situ observation of the epitaxial growth of PbSe(111) surfaces was performed, and oscillation of the specularly reflected X-ray intensity, showing the layer-by-layer growth of the surface, was successfully observed when the angle of incidence was made smaller than the critical angle of the X-ray total reflection.
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