Abstract
The state of the art of several in-situ monitoring techniques for gas assisted focused ion beam and focused electron beam induced processing (FIBIP and FEBIP) is presented. The monitoring techniques discussed comprise (a) the stage current and secondary electron signal for topographic information, (b) mass sensors to determine process yields, deposit density, molecule coverage and adsorption, (c) electrical resistance measurements, (d) reflectometry, (e) annular dark field sensing, and (f) SEM integrated mechanical measurements.
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