Abstract
In this paper, a new method is investigated to improve the breakdown voltage in the lateral power MOSFET transistors. The structure is based on Double Buried Metal Layers in the Lateral Diffused MOSFET and it is called DBML-LDMOSFET. The metal layers in the buried oxide under the drift region cause the electric field to be more uniform than the conventional structure. In the DBML-LDMOSFET Structure, the breakdown voltage is improved 25% compared to conventional structure and also the specific on-resistance is almost 11.32 mΩ.cm2. In order to investigate the performance of the structures, SILVACO-ATLAS software has been used and the results have been extracted.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
