Abstract
Vinyltriethoxysilane (VS) films with improved corrosion resistance and uniform thickness (∼2.8 μm) were fabricated on low carbon steel using a novel chemical etching method. The film forming mechanism occurred on the etched metal was investigated by experimental and theoretical methods. Results reveal that the metal hydroxylation and micro-rough surface generated in H2O2-containing etchant contribute to the enhancement of interfacial adhesion and protective performance for self-assembled films. However, there is an optimal etching time about 4 min forming denser interfacial layer with high adhesion of grade 1. Prolonged etching will cause inversely deterioration of the formed VS films.
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