Abstract

In this work, the effect of hydrogen dilution on the Ge content of the film and the effect of bandgap grading in the a-Si1−xGex:H absorber near the p/i and the i/n interfaces on cell performance were discussed. The a-Si1−xGex:H single-junction solar cells were improved by employing both p/i grading and i/n grading. The i/n grading increased the VOC and the FF while it also reduced the JSC as compared to the cell without grading. Presumably the potential gradient established by the i/n grading facilitates the hole transport hereby improved by the FF. On the contrary, the potential barrier established by the p/i grading seemed to limit the cell performance and constrain the p/i grading width below 20nm due to the drop in FF and JSC. Combining the effects of bandgap grading on the VOC, JSC and FF, the suitable thicknesses of the p/i and the i/n grading were 20nm and 45nm, respectively. Finally, the grading structures accompanied with further optimization in doped layers were integrated to achieve a cell efficiency of 8.59%.

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