Abstract
Samples of a-Si:H having a wide gap (≥2.1 eV) were prepared using routine rf glow discharge decomposition of silane (SiH4) strongly diluted with He. Also, microwave electron–cyclotron–resonance plasma-enhanced chemical-vapour-deposition was used to prepare wide-gap a-Si:H via decomposition of He diluted SiH4. The wide-gap a-Si:H samples, containing above 30 at.% of hydrogen, exhibit visible photoluminescence at room temperature. From the temperature dependence of photoluminescence intensity and from the observed shift of the maximum with temperature we deduce that the customary model of radiative recombination of carriers localised in tail states is not directly applicable to the case of wide-gap a-Si:H. Instead, we propose that the photoluminescence arises in parallel from tail states and from isolated (extrinsic) centres. Electroluminescence results obtained on a p–i–n structure with wide-gap a-Si:H are reported.
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