Abstract
A novel technology for the deposition of multilayer coatings is proposed. This technology combines electrospark alloying (ESA), pulsed arc evaporation (PAE), and magnetron sputtering (MS) in one vacuum production process. Layers can be deposited using one electrode material at operating pressures from 0.1 Pa to atmospheric pressure. The lower ESA layer provides increased substrate rigidity, perfect adhesion, and a relatively high (up to 100 μm) coating thickness. The upper PAE or MS layer, up to 10 μm in thickness, yields high mechanical and tribological characteristics. The deposition technology of bilayer PAE–ESA and MS–ESA coatings is approved for substrates made of structural and tool steels, titanium alloys using electrodes made of cemented carbides (WC–Co, TiCNiAl), and carbon.
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