Abstract
Photobleaching (PB) of oxy-chalcogenide (O-Ch) films is investigated by in situ transmission spectra measurements and compared with GeSe2 films free of oxygen. The structural changes in the exposed O-Ch films are revealed by high-resolution X-ray photoelectron spectroscopy. The laser illumination in air causes significant increase in the concentration of oxygen. The present results provide a direct evidence for the incorporation of oxygen in the glass network during irradiation and also indicate that photo-oxidation is one of the causes for PB. The PB in O-Ch films occurs as a consequence of photoreactions involving the breaking of Ge–Ge and Ge–Se bonds and formation of more stable Ge–O/Se–O bonds or fully oxidized GeO4 units of germanium oxide.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
