Abstract
AbstractThe composition space Na2O-ZrO2-SiO2-P2O5 was explored using thin film material libraries and high-throughput characterization methods. The combinatorial synthesis comprised non-reactive magnetron co-sputtering at room temperature from two elemental targets Zr and Si, and a compound Na3PO4 target followed by a two-step annealing process. The NASICON phase formed for all compositions on the material library produced at the optimized deposition parameters, also displaying a phase-pure Na1+xZr2SixP3−xO12 (x = 0.4—2.9) region. Analytical TEM analysis of the NASICON phase at a measurement area with stoichiometric composition revealed a fine-grained microstructure and homogeneous Si distribution, in contrast to Na-P excess conditions, where large Si-free NASICON grains have formed.
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