Abstract
High resolution X-ray scattering measurements on multilayer substrates and surfaces are reviewed. It is shown that the usual substrates of float glass and Si-wafers are dominated by large scale figure error, whereas samples of super polished SiC substrates are comparable in flatness and roughness to state-of-the-art test flats from current X-ray telescope programs. Likewise high resolution X-ray scattering from periodic multilayer structures is reviewed. It is demonstrated that the large scale figure error of the substrate has a profound effect on low resolution measurements. High resolution studies of specific multilayers reveal in a single case of a W/Si multilayer on a Si-wafer an essentially perfect layering.
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