High Repetition Rate Pulsed Power Generator for Extreme Ultraviolet Light Source

Abstract

Summary form only given. Recently, all solid-state pulsed power generators, which are operated with high repetition rate, long lifetime and high reliability, have been developed for industrial applications, such as high repetition rate pulsed gas lasers, discharges plasma in water and high energy density plasma for extreme ultraviolet (EUV) light sources. We have studied and developed a new high repetition rate all solid-state pulsed power generator for microlithography to discharge produced plasma EUV light source. The developed generator consists of a charger a capacitor bank, a semiconductor switch (IGBT), a pulse transformer and a multi-stage magnetic pulse compression circuit. This system can generate an output peak voltage of 30 kV with voltage rise time of about 80 ns, pulse repetition rate is over 10 kpps in burst operation. In this work, high repetition rate discharge plasmas were produced by the developed system and this discharge plasma used to EUV light source with simple circuit.