Abstract
We report on high-performance thermochromic ZrO2/V0.982W0.018O2/ZrO2 coatings with a low transition temperature prepared on glass by a low-temperature scalable deposition technique. The V0.982W0.018O2 layers were deposited by a controlled high-power impulse magnetron sputtering of V target, combined with a simultaneous pulsed DC magnetron sputtering of W target to reduce the transition temperature to 20–21 °C, at a low substrate surface temperature of 330 °C in an argon–oxygen gas mixture. ZrO2 antireflection layers both below and above the thermochromic V0.982W0.018O2 layers were deposited at a low substrate temperature (< 100 °C). A coating design utilizing a second-order interference in the ZrO2 layers was applied to increase both the luminous transmittance (Tlum) and the modulation of the solar transmittance (ΔTsol). The ZrO2/V0.982W0.018O2/ZrO2 coatings exhibit Tlum up to 60% at ΔTsol close to 6% for a V0.982W0.018O2 thickness of 45 nm, and Tlum up to 50% at ΔTsol above 10% for a V0.982W0.018O2 thickness of 69 nm.
Highlights
Vanadium dioxide ( VO2) undergoes a reversible phase transition from a low-temperature monoclinic V O2(M1) semiconductive phase to a high-temperature tetragonal V O2(R) metallic phase at a transition temperature (Ttr) of approximately 68 °C for the bulk material[1,2]
The V0.982W0.018O2 layers were deposited by controlled high-power impulse magnetron sputtering (HiPIMS) of V target, combined with a simultaneous pulsed DC magnetron sputtering of W target, at a low substrate surface temperature the coatings (Ts) = 330 °C and without any substrate bias voltage in an argon–oxygen gas mixture
High-performance thermochromic Z rO2/V0.982W0.018O2/ZrO2 coatings with a low transition temperature were prepared on soda-lime glass by a low-temperature scalable deposition technique which is compatible with the existing magnetron sputtering systems in glass production lines
Summary
Vanadium dioxide ( VO2) undergoes a reversible phase transition from a low-temperature monoclinic V O2(M1) semiconductive phase to a high-temperature tetragonal V O2(R) metallic phase at a transition temperature (Ttr) of approximately 68 °C for the bulk material[1,2]. In spite of recent significant progress in fabrication and performance of thermochromic VO2-based materials (see, for example, reviews[3,4,5,6,7,8] and the works cited therein), there are still serious drawbacks hindering their application in smart windows These are: a high temperature needed for fabrication, a high transition temperature, a low luminous transmittance (Tlum), a low modulation of the solar transmittance (ΔTsol) and low environmental stability. In our recent works[23,24], reactive high-power impulse magnetron sputtering (HiPIMS) with an effective pulsed oxygen flow control (applicable to large-area c oaters25) was used for low-temperature (300 °C) deposition of thermochromic V O2 films onto conventional soda-lime glass without any substrate bias voltage and without any interlayer. Be mentioned that HiPIMS techniques are compatible with existing magnetron sputtering systems utilized in industrial deposition d evices[26,27]
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