Abstract
This work was based on the studies of the influence of the plasma process on the characteristics of diamond-like carbon (DLC) films deposited by high density plasma chemical vapor deposition (HDP-CVD). DLC is a material that shows several good characteristics like high electrical resistivity, lower dielectric constant, high breakdown field, lower stress, high density, and hardness and chemical inertness. This material is important actually in mechanic, optic, and chemistry and mainly in microelectronic areas. For microelectronic process the best results were obtained by plasma of pure methane: low dielectric constant (1.7) and high resistivity 5×1013Ωcm.
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