Abstract
A thin film of cobalt, copper and Co/Cu multilayers deposited on Si(1 0 0) has been studied by an in situ combination of Auger electron spectroscopy and scanning tunnelling/scanning force microscopy. We show that thickness-dependent Auger peak intensity measurements, taken in situ during deposition of constituents of Co/Cu multilayers, combined with microscopy can bring valuable information about growth type of the system components.
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