Abstract
A graphite mold of a new design was made for growing better seeded crystals from the melt. The main features were (1) a narrow seed constriction, (2) a split mold, (3) high density graphite, (4) equal cross sections of seed and crystal, and (5) high ratio of sample to mass crucible mass. The resulting crystals were compared by two complementary techniques with those grown in a conventional mold. An improvement of at least a factor of ten was obtained. The best crystals thus far have 1−2×104 etch-pit sites/cm2 intersecting the {100} surfaces, and are free from subboundaries. This brings the level of perfection of as-grown seeded crystals up to that of unseeded ones thereby making them useful in dislocation etch-pit studies.
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