Growth of large patterned arrays of neurons using plasma methods

Abstract

To understand how large systems of neurons communicate, we need to develop, among other things, methods for growing patterned networks of large numbers of neurons. Success with this challenge will be important to our understanding of how the brain works, as well as to the development of novel kinds of computer architecture that may parallel the organization of the brain. We have investigated the use of metal ion implantation using a vacuum-arc ion source, and plasma deposition with a filtered vacuum-arc system, as a means of forming regions of selective neuronal attachment on surfaces. Lithographic patterns created by the treating surface with ion species that enhance or inhibit neuronal cell attachment allow subsequent proliferation and/or differentiation of the neurons to form desired patterned neural arrays. In the work described here, we used glass microscope slides as substrates, and some of the experiments made use of simple masks to form patterns of ion beam or plasma deposition treated regions. PC-12 rat neurons were then cultured on the treated substrates coated with Type I Collagen, and the growth and differentiation was monitored. Particularly good selective growth was obtained using plasma deposition of diamond-like carbon films of about one hundred Angstroms thickness. Neuron proliferation and the elaboration of dendrites and axons after the addition of nerve growth factor both showed excellent contrast, with prolific growth and differentiation on the treated surfaces and very low growth on the untreated surfaces.