Abstract
Films formed by evaporating TiO onto NaCl cleavage surfaces (room temperature ∼400°C) in a vacuum of about 10-8 Torr were studied by electron microscopy. The composition measured by an X-ray micro-analyser and an Auger electron spectrometer ranged from TiO0.8 to TiO0.9 for films formed at room temperature and the oxygen in the films decreased as the substrate temperature increased. The diffraction patterns of the films changed from halo-like rings to hcp rings passing through a stage of broad fcc rings with the increase of the substrate temperature. They also verified that the film had many stacking faults. Epitaxial fcc crystallites which were found to grow preferentially along steps of the substrate surface were also formed at above 150°C. The origin of the stacking fault was discussed on the basis of Paterson's theory and the phase diagram of titanium oxide.
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