Growth and Structural Characteristics of CuGaSe2 Films Fabricated from Metallic Precursors Followed by an Elemental Se Reaction Process.

Abstract

We investigated the growth, structural and optical characteristics of CuGaSe2 thin films prepared with the selenium reaction. Metallic precursor layers from Cu0:5Ga0.5 and Cu0.8Ga0.2 alloy targets were prepared on a sodalime glass substrate by using DC magnetron sputtering, and then annealed to form CuGaSe2 in a rapid thermal process (RTP) with selenium radicals generated by a thermal cracker. The base and sputtering pressures were < 5 x 10(-7) Torr and 30 mTorr, respectively. At ambient temperature, the precursors from the Cu0.5Ga0.5 and Cu0.8Ga0.2 targets were deposited at the rates of 42 nm/min. and 45 nm/min., respectively. The film thicknesses were about 300 nm. Selenization was carried out at different annealing temperatures of T(a) = 450 degrees C, 500 degrees C, 550 degrees C, and 600 degrees C for time periods of 15 min., 30 min., and 60 min. We found that high quality CuGaSe2 films of crystal grains (-1 μm in dia.) fabricated with a reaction using elemental Se at temperatures as low as 450 degrees C for 30 min. When T(a) ≤ 350 degrees C, the Se reaction was insufficient to form CuGaSe2. However, the annealing time had little effect on the formation of CuGaSe2 at T(a) ≥ 450 degrees C. For all the samples, the photoluminescence (PL) emission was only from the donor-acceptor interband transition D1A1 for all the composition ratios of the films [Ga]/[Cu] -1.