Abstract
Ga In P ∕ Ga As ∕ Ga In P double heterojunction bipolar transistor (DHBT) with an Al0.11Ga0.89As layer within lowly doped GaAs–GaInP composite collector was characterized. In comparison to an abrupt GaInP∕GaAs∕GaInP DHBT with saturation voltages in excess of 20V, current gains of 25 at high biases, and breakdown voltages in the range of 22V, the DHBT incorporating GaAs–Al0.11Ga0.89As–GaInP composite collector has demonstrated lower saturation voltages of less than 6V and high current gains of 50 without compromising the breakdown voltages of the GaInP collector. Al0.11Ga0.89As layer can thus provide an alternative design to effectively minimize the potential spike effects at the GaAs∕GaInP heterojunction.
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