Abstract
The present study explores lateral broadening effects of 3D structures fabricated through focused electron beam induced deposition using MeCpPt(IV)Me3 precursor. In particular, the scaling behavior of proximity effects as a function of the primary electron energy and the deposit height is investigated through experiments and validated through simulations. Correlated Kelvin force microscopy and conductive atomic force microscopy measurements identified conductive and non-conductive proximity regions. It was determined that the highest primary electron energies enable the highest edge sharpness while lower energies contain a complex convolution of broadening effects. Moreover, it is demonstrated that intermediate energies lead to even more complex proximity effects that significantly reduce lateral edge sharpness and thus should be avoided if desiring high lateral resolution.
Highlights
Focused electron beam induced deposition (FEBID) has attracted increasing attention due to capability to directly write functional (3D) structures with nanometer resolution [1,2,3]
A full set of FEBID structures have been deposited with different primary electron energies (5–30 keV), similar beam currents (98–150 pA) and varying deposit thicknesses between 5 and 132 nm
Considering the cross-section of MeCpPt(IV)Me3 precursor molecules [3,17,49,50] with its maximum clearly below 1 keV, it is very likely that secondary electrons type II (SE-II) are mainly responsible for the dissociation a direct dissociation through backscattered electrons (BSEs)-S is likely to contribute
Summary
Focused electron beam induced deposition (FEBID) has attracted increasing attention due to capability to directly write functional (3D) structures with nanometer resolution [1,2,3]. Compared to lithography-based methods, FEBID does not require pre- or post-growth treatments and can be used on nonflat surfaces. This makes this technique a potential candidate for an enabling nanofabrication technology. The technique relies on the local nano-synthesis of precursor molecules by a focused electron beam and its subsequent electron emission from the substrate and the deposit itself [1,3,4,5,6].
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