Abstract

Free Standing Porous Graphene and Reduced Graphene Papers manufactured from Sedimentation of Arc Discharge of Graphite Rods. At SignEcoTech, novel and newer nano-carbons such as hard carbons, homogenized graphene, low defect highly crystalline graphene’s, and wrinkled graphene [1-14]. Here, Graphene Oxide papers have been synthesized previously by flow-directed assembly, where the pressure of air within the assembly supports graphene oxide sheets in their nano-crystalline colloidal solution being filtered on nano-porous filter paper. However in this research, we haven’t used any filter paper, or directed flow assembly, but sedimentation of the colloidal solution in ethyl alcohol in a dish. Then, the wrinkled the hierarchical GO sheets fall under gravity by sedimentation. Wrinkling in GO was enhanced by low defects, multi-layer clusters, and variegated + edge interaction amongst graphene clusters, as such the sedimented graphene papers were porous, intertwined and free standing. The composition of GO was confirmed by XPS, while the low defect level clearly marked by higher planar order and low ID/IG band. The wrinkled, multilayer clusters and carbonic surface properties of the graphene oxide sheets enhanced fast sedimentation, evaporation of the alcohol and formation of porous GO structure. The porous reduced\\GO morphology is captured by optical microscope. Keywords: Wrinkled GO Papers, Reduced Graphene, Arc Discharge, Modified Hummers Method

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.