Abstract
Synthesis of threadlike nanostructures of silicon and silicon carbide by chemical vapor deposition (CVD) using dichlorosilane pyrolysis in the presence of CCl4 and CF2Cl2 in nitrogen has been carried out. Nitrogen molecules react on active surface areas of the substrate originating during etching with a gaseous mixture of 7.5% SiH2Cl2–7.5% CCl4–85% N2.
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