Abstract
The influence of substrate temperature on the morphology of indium tin oxide films deposited by magnetron sputtering and electron beam evaporation is demonstrated. It is found that during magnetron sputtering, the degree of film structuring increases with a rise in the substrate temperature. Based on the X-ray phase analysis of the samples, the structured films are described in terms of two phases: the first of which is an untextured sublayer with the properties corresponding to the material obtained at room temperature; the second one is textured elongated crystals with a large cell parameter, a large crystallite size, and without microstrains. The structural features and optical characteristics of studied films are compared with the structured film obtained by electron beam evaporation. The study of transmission and reflection spectra of the obtained films show that the film deposited at a temperature of 400°C are characterized by the antireflection effect over a wide range of wavelengths.
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