Abstract
Abstract A highly tetrahedral form of hydrogenated amorphous carbon (ta-C:H) with maximum density of 2.9 g cm−3, sp3 fraction of 0.75 and hardness of 61 GPa has been deposited from acetylene using a low pressure plasma beam source. The ion energy dependence of its properties suggests that the subplantation deposition model of a-C also describes the deposition of a-C:H.
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