Abstract
Fused silica subwavelength structures (SWSs) with an average period of ~100 nm were fabricated using an efficient approach based on one-step self-masking reactive ion etching. The subwavelength structures exhibited excellent broadband antireflection properties from the ultraviolet to near-infrared wavelength range. These properties are attributable to the graded refractive index for the transition from air to the fused silica substrate that is produced by the ideal nanocone subwavelength structures. The transmittance in the 400–700 nm range increased from approximately 93% for the polished fused silica to greater than 99% for the subwavelength structure layer on fused silica. Achieving broadband antireflection in the visible and near-infrared wavelength range by appropriate matching of the SWS heights on the front and back sides of the fused silica is a novel strategy. The measured antireflection properties are consistent with the results of theoretical analysis using a finite-difference time-domain (FDTD) method. This method is also applicable to diffraction grating fabrication. Moreover, the surface of the subwavelength structures exhibits significant superhydrophilic properties.
Highlights
Fused silica subwavelength structures (SWSs) with an average period of ~100 nm were fabricated using an efficient approach based on one-step self-masking reactive ion etching
A fused silica cone-like profile with the polymer nanodot tips was formed using reactive radical etching of the substrate surface (Fig. 1B)
The polymer nanodots were etched during the RIE process, but the etching speed was much slower than the fused silica
Summary
Fused silica subwavelength structures (SWSs) with an average period of ~100 nm were fabricated using an efficient approach based on one-step self-masking reactive ion etching. The subwavelength structures exhibited excellent broadband antireflection properties from the ultraviolet to nearinfrared wavelength range. The measured antireflection properties are consistent with the results of theoretical analysis using a finite-difference time-domain (FDTD) method This method is applicable to diffraction grating fabrication. All of these nanofabrication methods have drawbacks, such as the use of multiple expensive steps and time-consuming procedures. Well-ordered monolayer particle arrays can be used as etching masks This approach is based on a simple and scalable self-assembly technique for fabricating SWSs on a planar or grated silicon substrate surface[17,18]. Contamination by aluminum impurities during SWSs fabrication resulted in a low laser damage threshold[20,21]
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