Abstract
Essential reaction induced by KrF laser irradiation in GeO2—SiO2 glasses was the pair generation of electron-trapped centers of Ge ion (GEC) and self-trapped hole (STH) centers of bridging oxygen. The GEC relaxed to GeE’ center during irradiation. This relaxation proceeded quickly with increasing GeO2 content. The concentration ratio of [STH] to [GEC + GeE'] was approximately 1:2. After annealing at room temperature, the majority of STH recombined with GEC (or GeE'). It was considered that the origin of this charge imbalance was the hole transfer from STH to other ions.
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