Abstract
Vertical graphene (VG) arrays show exposed sharp edges, ultra-low electrical resistance, large surface-to-volume ratio, and low light reflectivity, thus having great potential in emerging applications, including field emission, sensing, energy storage devices, and stray light shields. Although plasma enhanced chemical vapor deposition (PECVD) is regarded as an effective approach for the synthesis of VG, it is still challenging to increase the growth rate and height of VG arrays simultaneously. Herein, a fluorobenzene and water-assisted method to rapidly grow VG arrays in an electric field-assisted PECVD system is developed. Fluorobenzene-based carbon sources are used to produce highly electronegative fluorine radicals to accelerate the decomposition of methanol and promote the growth of VG. Water is applied to produce hydroxyl radicals in order to etch amorphous carbon and accelerate the VG growth. The fastest growth rate can be up to 15.9µm h-1 . Finally, VG arrays with a height of 144µm are successfully synthesized at an average rate of 14.4µm h-1 . As a kind of super black material, these VG arrays exhibit an ultra-low reflectance of 0.25%, showing great prospect in stray light shielding.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
