Abstract
The AlN/GaN/AlN heterostructure is attractive for microwave and millimeter-wave power devices due to its thin top barrier, tight carrier confinement, and improved breakdown voltage. This work explores the large-signal RF performance of high-electron-mobility transistors on this heterostructure. Results are highlighted by record high on-current of 3.6 A/mm, and record maximum oscillation frequency ( $f_{max}$ ) of 233 GHz. The load-pull power sweep at 10 GHz demonstrate a peak power added efficiency (PAE) of 22.7% with an associated gain ( $G_{T}$ ) of 8.7 dB and output power ( $P_{out}$ ) of 3 W/mm. When optimized for power, the peak $P_{out}$ of 3.3 W/mm has an associated PAE of 14.7% and $G_{T}$ of 3.2 dB. This first demonstration is encouraging for the mm-wave power potential of the AlN/GaN/AlN HEMT.
Highlights
The demand for millimeter-wave power amplifiers continues to grow for next-generation cellular communication networks and defense radar applications
A T-gate geometry was incorporated on the AlN/GaN/AlN devices and output power assessment was performed for the first time
EPITAXIAL GROWTH AND DEVICE FABRICATION The AlN/GaN/AlN heterostructure measured in this report was grown by plasma-assisted Molecular Beam Epitaxy (MBE) on highly resistive 6H silicon carbide
Summary
The demand for millimeter-wave (mm-wave) power amplifiers continues to grow for next-generation cellular communication networks and defense radar applications. HICKMAN et al.: FIRST RF POWER OPERATION OF ALN/GaN/ALN HEMTs WITH >3 A/mm AND 3 W/mm AT 10 GHz two-dimensional electron gas (2DEG) closer to the gate (5 nm) for more effective channel modulation.
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