Abstract
Fabrication of fine grating on a glass surface is achieved by imprint lithography using a Si 3N 4/SiO 2/Si mold and a low T g glass. A fine Si based mold is fabricated by a conventional VLSI process and the mold is directly pressed to a thin glass plate using a hot-press machine. The imprint conditions are designed based on the measured visco-elastic properties of the glass. Sub-micron patterns down to 250 nm in line width are successfully fabricated on the glass surface at low temperature without fatal errors. As the line width becomes smaller, higher pressures are required to achieve full compression. The surface of the imprinted glass is very flat.
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