Abstract
Nano-sheet carbon films (NSCFs) coated with very thin (≈5-nm-thick) metal layers were fabricated on Si wafer chips by means of quartz-tube-type microwave-plasma chemical-vapour-deposition method with hydrogen–methane gas mixture and an electron beam evaporation method. Field emission (FE) current densities obtained at a macroscopic average electric field, E, of ≈10V/μm changed from 13mA/cm2 for NSCF with no coated metal to 1.7, 0.7 and 30mA/cm2 for Ti-, Al- and Au-coated NSCFs, respectively, while the threshold E varied from 4.4V/μm for the former one to 5.3, 5.4 and 2.0V/μm for the corresponding latter ones, respectively. As the FE currents of Au-coated NSCFs tended to be saturated in a higher E region, compared to those of NSCFs with no coated metal, no simple Fowler–Nordheim (F–N) model is applicable. A modified F–N model considering statistic effects of the FE tip structures and a space-charge-limited-current effect is successfully applied to an explanation for the FE data observed in the low and high E regions.
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