Abstract
A novel self-aligned ‘soft masking’ method that is compatible with traditionalphotolithographic processes is demonstrated. This method uses a suspension of ultrafineiron oxide grains (ferrofluid) to protect or de-protect selected areas of a magneticallypatterned substrate according to a programmable sequence. Automatic mask formation andregistration is controlled by ferromagnetic alignment marks patterned on a substrate.External magnetic field bias applied to the system causes ferrofluid to aggregate only overdesignated areas on the surface, thereby masking those areas from UV or chemicalexposure.
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