Abstract
We studied the recovery of the elastic constant of sputtered Ag films on monocrystal Si substrates by monitoring the resonance frequency of film/substrate specimens throughout the deposition process using resonant-ultrasound spectroscopy. An Ag film is deposited on a (001) Si substrate, which is located on the tripod transducer set in the sputtering chamber. The free-vibration resonance frequency of the Ag/Si specimen is measured before, during, and after the magnetron sputtering deposition, inducing the evolution of the elastic constants of the deposited film. Recovery of the elastic constants of the Ag film is completed within 40 min. The recovery behavior of the elastic constants is similar to that of residual stress; the recovery rate is comparable to that for residual stress.
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