Fabrication of step and flash imprint lithography templates using a variable shaped-beam exposure tool

Abstract

If imprint lithography is to be considered as a viable method for fabricating high density silicon-based circuits, an infrastructure must be established that is capable of supplying users with 1X templates. It is critical, therefore, that tools are available that can expose, inspect, and repair these templates. The purpose of this work is to present initial step and flash imprint lithography template results using a shaped-beam system. A Leica SB350 MW was used to expose ZEP 7000 resist. The SB350 is a variable shaped-beam tool with 50 kV electron optics. A Motorola template pattern transfer process was used to obtain final images in the template. Trenches as small as 33 nm were resolved, as were 44 nm holes. Further improvements may be possible by increasing the operating voltage to 100 kV, and further increasing the e-beam system line edge acuity.