Abstract
The fabrication of self-assembled InGaAs squarelike nanoholes on GaAs(001) substrates grown by droplet epitaxy using molecular beam epitaxy was reported. The formation mechanism is explained by the As4 diffusion in droplets during the supply of As4 flux. The effects of substrate temperature (300–390 °C) during the InGa droplet deposition on their dimension and density were investigated. The surface morphology of InGaAs nanoholes as well as their depth profile was examined by atomic force microscopy (AFM). The square shape is oriented along [110] and [110] crystallographic directions with slightly different profiles due to anisotropy behavior. The size uniformity of the squarelike nanoholes is well controlled with less deviation at higher substrate temperatures.
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