Abstract
Dip pen nanolithography (DPN) based on atomic force microscopy (AFM) is a direct-write lithography technology, in which an AFM tip is used to generate nano- or micro-patterns of materials on surfaces. Tip modification has been attracting a good deal of attention to improve the performance of DPN patterning. Herein, we present a new and simple method that uses electron beam irradiation to fabricate a PVP hydrogel polymer coated DPN probe. Using this tip, we generated dot arrays of fluorescent materials and measured patterns by AFM and fluorescence microscopy.
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