Abstract
Patterned films of a low-polydispersity polymer densely end-grafted on a silicon substrate were fabricated for the first time by the combined use of the Langmuir−Blodgett (LB) and the surface-initiated atom transfer radical polymerization (ATRP) techniques: a blend monolayer of 2-(4-chlorosulfonylphenyl)ethyltrimethoxysilane (CTS: ATRP initiator) and n-octadecyltrimethoxysilane (OTS: noninitiator) was immobilized on a silicon wafer by the LB technique, and then the ATRP of methyl methacrylate was carried out on the modified wafer in the presence of the Cu/ligand complexes. Atomic force microscopic studies revealed that the CTS/OTS blend was immiscible and phase-separated into two monolayer phases: most OTS molecules aggregate with each other, forming a condensed-type monolayer domain with CTS molecules excluded from there almost perfectly, and the remaining OTS molecules are incorporated in the matrix region. This 2-dimensionally phase-separated structure was successfully amplified by the controlled g...
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