Abstract
We report a simple way of etching lithium niobate (LN) to build ridge waveguides. Argon plasma is used in an RF-sputtering chamber to etch the LN. The height of waveguide walls reaches 2.5 μ m and a titanium self-alignment in-diffusion process is used to make the waveguide. Several diffusion times and different waveguides width are used to compare the mode properties and proportion of light that is confined in the ridge section of the waveguide.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
