Abstract
AbstractDry film resist has been used in the fabrication of Masters in microfluidic devices for droplet generation. The minimum feature size in the resist was controlled by the type of mask (transparency or electron beam Cr mask), the resolution of the pattern in transparency masks (2400 or 5080 dpi) and thickness of resist in the range from 35 to 140 μm. The Master patterns formed in dry resist were replicated as a Ni shim and then hot embossed into Plexiglas 99524. These devices were used to generate water-in-oil droplets with a well defined dependence of diameter and frequency on flow parameters. The application of dry laminar resist and transparency masks has allowed the rapid fabrication of prototype devices.
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