Abstract
Anti-reflective coatings are widely used on the surfaces of solar cells to increase the efficiency of photoelectric conversion. Sub-wavelength structures have gradually replaced conventional anti-reflective (AR) thin films due to their broadband AR properties. This paper successfully fabricated structures with a variety of surface morphologies on Si substrate using polystyrene sphere lithography in conjunction with two-step inductive coupling plasma (ICP) and high density plasma (HDP) etching processes. We successfully fabricated various sub-micron structures with heights of 700nm and above. Experimental results show that the sub-micron pyramidal structure has the best anti-reflection performance with the average reflectance effectively suppressed to below 1% across the spectral range of 300–1200nm.
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