Abstract
Abstract Nano-structured photon management is currently an interesting topic since it can enhance the optical absorption and reduce the surface reflection which will improve the performance of many kinds of optoelectronic devices, such as Si-based solar cells and light emitting diodes. Here, we report the fabrication of periodically nano-patterned Si structures by using polystyrene nano-sphere lithography technique. By changing the diameter of nano-spheres and the dry etching parameters, such as etching time and etching power, the morphologies of formed Si nano-structures can be well controlled as revealed by atomic force microscopy. A good broadband antireflection property has been achieved for the formed periodically nano-patterned Si structures though they have the low aspect ratio (<0.53). The reflection can be significantly reduced compared with that of flat Si substrate in a wavelength range from 400 nm to 1200 nm. The weighted mean reflection under the AM1.5 solar spectrum irradiation can be as low as 3.92% and the corresponding optical absorption is significantly improved, which indicates that the present Si periodic nano-structures can be used in Si-based thin film solar cells.
Highlights
Introduction itiveDue to the increased environment problems and the decreased availability of fossil fuel sources, many research efforts has been in developing the clean renewable energy technologies
The morphologies of the nano-patterned Si structures obtained by using PS nano-spheres lithography technique was characterized by atomic force microscopy (AFM) measurements
It is shown in AFM images that the nearly closepacked Si structures are formed and the periodic length of formed Si nano-structures is consistent with the diameter of used PS nano-spheres, which suggests that one can control the periodicity of Si nano-patterned structures by choosing PS nano-spheres with the suitable sizes
Summary
Introduction itiveDue to the increased environment problems and the decreased availability of fossil fuel sources, many research efforts has been in developing the clean renewable energy technologies. Our experiment results demonstrate that PS nano-sphere lithography technique is an effective way to get uniform and periodically nanopatterned Si structures in a large area and the surface morphology of nano-patterned structures can be well controlled by changing the etching parameters such as r.f power and time.
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