Abstract
Rectangular Permalloy nanostructures with different edge roughness, but the same average width, were fabricated by controlled variations in the exposure conditions of an electron-beam lithography process. The average widths that were studied ranged from 200 to 640 nm. Structures were characterized individually using magneto-optical Kerr effect single-structure nanomagnetometry and scanning electron microscopy on the same structure. Increased edge roughness caused increased coercivity, except for 200-nm-wide structures. Large edge roughness doubled the coercivity of wide (>600nm) structures. The coercivity of nominally identical structures (same roughness amplitude) differed by up to 20 Oe, suggesting that the specific edge profile influences magnetic switching.
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