Abstract
A thin film strain gauge employing evaporated chromium or platinum resistance patterns sandwiched between silicon monoxide layers, and based on a ceramic coated molybdenum substrate, has been developed which possesses good stability at temperatures of up to 600°C in an atmosphere of carbon dioxide; to provide temperature compensation, the resistance pattern is deposited in the form of a Wheatstone bridge arrangement. This type of element would appear to have characteristics superior to those of the commercial nichrome foil gauges under these conditions, and to be suitable for both alternating and static strain measurements. Gauges with silicon monoxide protected chromium resistive films deposited on sapphire, have been shown to be stable up to temperatures in excess of 800°C, although the use of this substrate at elevated temperatures requires that the test piece to which the gauge is attached is closely matched in expansion coefficient.
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