Evaluation of Low Stress Photo-Sensitive Spin On Dielectric Layers for Through Silicon Via (TSV) Copper Redistribution Layers

Abstract

To increase performance of semiconductor devices advances in packaging such as chip stacking (3D) and silicon carrier technologies (SoC) are being developed. Adaptation of these packaging fabrication methods offers the ability to incorporate functionality as well as provide memory and power distribution on one IC with increased signal bandwidth. An enabling element in both the stacking and silicon carrier technologies is through silicon vias (TSV) which electrically connect dies to a silicon carrier or via stacked chips (1). Creation of TSV involves via fabrication, wafer thinning and back side wafer finishing, to name a few, some of which are relatively new to semiconductor processing. Furthermore, because the wafer backside is accessible it can now be utilized to route wiring to further increase package density. The focus of this research was to evaluate photo-sensitive spin on dielectric materials (SOD) that can be used as the backside wiring levels, commonly referred to as redistribution layers (RDL) in TSV technologies. The two materials evaluated are; the epoxy based Dow INTERVIA™ 8023 Dielectric and the Benzocyclobutene (BCB) polymer, Dow CYCLOTENE™ 4000 product series. These dielectric materials have low stress and provide good planarization (2). Test vehicles with a chip size of 3.7 cm x 2.26 cm were fabricated with a 6 um wide copper RDL layer using the SOD materials of interest as well as conventional PECVD SiO2/SiN dielectric layers. The large chip size accommodated parallel Cu lines running 1.8 cm long with a spacing of 3 m and represented an aggressive shorting test for the SOD materials. It also enhances chip distortion after thinning and is evaluated for all three test vehicles. Chips were then electrically tested through simulated 260° C reflow cycles (for flip chip joining) and accelerated thermal reliability tests from −55° C to 125° C for 1000 cycles.