Abstract
The epitaxially induced strains in thin Cu 2O films on the (100), (111), (110) and (311) faces of copper single crystals were characterized in terms of changes produced in the optical properties of the films. Oxide on the (110) and (311) exhibited optical anisotropy while that on the (100) and (111) did not. These results were rationalized in terms of the epitaxial relationships between the oxide and substrate. Changes in the degree of anisotropy with film thickness were investigated for films on the (110) and (311). The degree of anisotropy was observed to pass through a maximum.
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