Abstract
In the present research, we proposed a method of controlling the photoelastic constant using surface acoustic waves, which had not previously been reported, and carried out experimental studies thereof. A Bragg diffraction was carried out to determine the photoelastic constants of Ta 2O 5. As a result, it is confirmed that the photoelastic constant of a Ta 2O 5 thin film undergoing a sputtering process, during which surface acoustic waves were excited on the substrate, was about 2.19–2.27 times larger than those of thin films on which surface acoustic waves were not excited.
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