Abstract
The method of spectral modulation ellipsometry is used to investigate the structure and optical properties of thin TiOx coatings deposited by magnetron with various oxygen concentrations in the plasma, a working pressure of 0.28 Pa, and a discharge current of 5.6 A. It is established that, depending on the fraction of O2, three types of coatings are formed in the plasma: semitransparent three-layer coatings, transparent two-layer coatings, and transparent three-layer coatings. The last coatings have a dense contact layer up to 50 nm thick, whose optical characteristics correspond to crystalline anatase and/or rutile. A correlation is established between the roughness, the band gap, and the impurity concentration in the plasma. It is pointed out that, with 19 vol. % O2, coatings with a low refractive index (2.347), a small band gap (3.31 eV), and high roughness (16.8 nm) are deposited in the plasma, and this must increase the photocatalytic activity of the coatings.
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