Abstract
Low-energy electrons are released whenever ionizing high-energy radiation interacts with matter. They drive chemical reactions in the irradiated material, enable state-of-the art nanofabrication technologies such as focused electron beam induced deposition (FEBID), and contribute to the reactions of resist materials in extreme ultraviolet lithography (EUVL). This contribution presents fundamental research on the role of low-energy electrons in FEBID and EUVL. We discuss how reactions initiated by low-energy electrons can be exploited in FEBID to obtain metal-containing deposits with optimal purity. Regarding EUVL, the role of low-energy electrons in the conversion of an inorganic resist by EUV absorption has been investigated.
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