Abstract

To improve power efficiency and endurance of magnetic memory technologies, a voltage-controlled mechanism is desirable. The voltage control of magnetic anisotropy (VCMA) effect in MgO stacks is a promising option, however, its strength is too low for memory applications. Replacing the standard MgO layer by an oxide with a higher permittivity $\ensuremath{\kappa}$ may help improve the VCMA strength. We demonstrate a VCMA effect up to $\ensuremath{\xi}=75$ fJ/Vm at room temperature in a Co\ensuremath{\setminus}Pt bilayer grown on atomic layer deposited (ALD) high-$\ensuremath{\kappa}\phantom{\rule{4pt}{0ex}}{\mathrm{SrTiO}}_{3}$ (STO). After treating the STO surface with isopropanol, a thin ${\mathrm{CoO}}_{x}$ interfacial layer is observed, enabling VCMA. Upon cooling down from room temperature to 200 K, the VCMA effect strength increases by a factor of two. This increase is incompatible with the expected Arrhenius temperature dependence for an ionic effect and thus we argue that the observed VCMA effect is electronic. Electronic VCMA is desirable for adequate memory endurance, and hence the approach proposed here has great potential for applications.

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.